The highlighted elements are used at the chair of MEMS materials. In most cases elemental targets are used for the synthesis of thin film combinatorial materials libraries by sputter deposition. The gaseous elements Ar, N, O are used as sputter gases. In special cases we are also using alloy targets.
1H |
2He |
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3Li |
4Be |
5B |
6C |
7N |
8O |
9F |
10Ne |
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11Na |
12Mg |
13Al |
14Si |
15P |
16S |
17Cl |
18Ar |
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19K |
20Ca |
21Sc |
22Ti |
23V |
24Cr |
25Mn |
26Fe |
27Co |
28Ni |
29Cu |
30Zn |
31Ga |
32Ge |
33As |
34Se |
35Br |
36Kr |
37Rb |
38Sr |
39Y |
40Zr |
41Nb |
42Mo |
43Tc |
44Ru |
45Rh |
46Pd |
47Ag |
48Cd |
49In |
50Sn |
51Sb |
52Te |
53I |
54Xe |
55Cs |
56Ba |
72Hf |
73Ta |
74W |
75Re |
76Os |
77Ir |
78Pt |
79Au |
80Hg |
81Tl |
82Pb |
83Bi |
84Po |
85At |
86Rn |
|
87Fr |
88Ra |
104Rf |
105Db |
106Sg |
107Bh |
108Hs |
109Mt |
110Ds |
111Rg |
112Cn |
113Uut |
114Uuq |
115Uup |
116Uuh |
117Uus |
118Uuo |
|
Lanthanoide |
57La |
58Ce |
59Pr |
60Nd |
61Pm |
62Sm |
63Eu |
64Gd |
65Tb |
66Dy |
67Ho |
68Er |
69Tm |
70Yb |
71Lu |
Actinoide |
89Ac |
90Th |
91Pa |
92U |
93Np |
94Pu |
95Am |
96Cm |
97Bk |
98Cf |
99Es |
100Fm |
101Md |
102No |
103Lr |

