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Ultra-high vacuum combinatorial magnetron sputter system
Ultra-high vacuum combinatorial magnetron sputter system for the fabrication of binary, ternary and quaternary
thin film material libraries using multilayer thin films.
Combinatorial thin film deposition (K3)
K3 is a turbopumped HV chamber with 3 confocal cathodes (1x each DC, RF, bipolar pulsed DC). This chamber is designed for depositing films of oxides and nitrides, and has a heater capable of going to 850°C in oxyxgen or nitrogen environments, as well as RF bias on the substrate.
High-Throughput cantilever test stand
(a) Setup for characterization of thin film stresses as a function of temperature (σ(T)), (b) measurement principle:
the deflection of each cantilever is detected by a laser beam (parallel line optics) reflected from the free ends of
the cantilevers onto a screen and captured by a camera (enhanced online).
High throughput test stand (HTTS)
The high throughput test stand (HTTS) is a custom made unit, specially designed for the rapid characterization of thin film materials libraries which in our case are commonly deposited on 4” Si-wafers. Depending on the installed measurement module, electrical or magnetical properties of the materials library can be measured.
X-ray diffraction measurement setup
The PANalytical X’Pert PRO X-ray diffraction system is used for the high-throughput characterization of material libraries. Phase analysis of thin films and bulk samples can be performed, as well as reflectometry of thin layers and analysis of residual stresses. The system is equipped with a PiXcel detector that permits the acquisition of diffraction patterns in short times. Also, the phase analysis of batches of samples is possible. The analysis of small spots can be performed via using a microcapillary having 800 µm in diameter.
Cleanroom
The cleanroom at the Chair for MEMS Materials is class 1000, and includes tools for photolithography and further microstructuring.