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The scientific
programme of EUROCVD-15 consists of invited and keynote lectures
as well as contributed papers, either oral or poster presentation.
General
Information
The programme is arranged according to the abstracts/manuscripts
accepted by the Local Organising Committee on previous approval
of the National and International Advisory Boards.
Information
for Oral Presentation and Technical Equipment:
Language
English
will be the official language of the conference. There will be no
simultaneous translation.
Late News
Abstract
Additional
poster presentations will be considered as Late News Abstracts.
A copy of the abstract should be submitted to the EUROCVD organising
committee through eurocvd@rub.de
not later than 1st August 2005.
One page abstracts
can be submitted and should include the title of the paper and the
full names of the authors with affiliation and contact information.
Authors of accepted Late News Abstracts will be notified not later
than August 15, 2005. The authors of Late News Abstracts which have
been accepted for the conference will have the opportunity to present
their posters during the conference.
Important
Note: The accepted Late News Abstracts will not be published
in the bound proceedings volume (ECS) of the conference.
Scientific
programme:
Poster
Session I :
Poster
Session II :
The scientific
programme of EUROCVD-15 consists of invited and keynote lectures
as well as contributed papers, either oral or poster presentation.
Invited Lectures: The author is allowed 30 minutes for presentation
and 5 minutes for discussion
Keynote
Lectures: The author is allowed 25 minutes for presentation
and 5 minutes for discussion
Oral Presentation:
The author is allowed 15 minutes for presentation and 5 minutes
for discussion
Poster Presentation:
Posters will form an important part of the conference. Monday and
Wednesday evening has been set aside for formal viewing and discussion
of posters.
The scientific
presentation of the poster must follow these rules:
- The useful
space for the poster is 85 cm wide and 115 cm high
- The title,
authors name, affiliation and address must have a size of lettering
which must be legible at a distance of 2 meters. The board will
have your poster code number in the upper right corner which can
be found in the final programme.
- The authors
are asked to be present at their poster at the hours indicated on
the timetable.
The programme
is divided into the following topics:
| FSM
Fundamentals, Simulations and Modelling |
ALD
Atomic Layer Deposition |
| SPM
Special Techniques, Precursors and Materials |
MMS
Metals, Metal electrodes and Semiconductors |
| CCC
Carbon, Carbon nanotubes, Carbon structures |
MOD
Metal Oxides and Dielectrics |
| PEC
Plasma Enhanced CVD |
CHM
Coatings and Hard Materials |
| N&N
Nanoparticles and Nanocomposites |
|
CONFERENCE SCHEDULE
| .. |
Monday
05.09.2005
|
Tuesday
06.09.2005
|
Wednesday
07.09.2005
|
Thursday
08.09.2005
|
Friday
09.09.2005
|
| 8:45-9:00 |
Opening
Ceremony |
.. |
.. |
.. |
.. |
| 9.00-13:00 |
FSM-I |
CCC |
N&N-II
and PEC |
ALD-II
and MMS |
MOD
and CHM
Closing Ceremony |
| 13:00-
14:15 |
Lunch |
Lunch |
Lunch |
Lunch |
Lunch |
| 14:15-
18:00 |
FSM-II
and
SPM
|
EUROCVD
Excursion
|
ALD
and N&N-I |
MOD-I
and MOD-II |
..EUROCVD
Board Meeting
|
| 18:00-19:30 |
Poster
Session |
.. |
Poster
Session |
Conference
Dinner |
.. |
INVITED SPEAKERS
| ACADEMIA: |
|
|
D. Barreca
|
Advances
in synthetic strategies for metal oxide systems: A non-conventional
hybrid CVD/Sol-gel Approach |
Molecular
Sciences and Technology Institute-CNR-Padova, Padova, Italy |
|
S. George |
Atomic
layer deposition on polymers |
Department
of chemistry and biochemistry , University of Colorado Boulder,
USA |
|
A. Goosens |
Nanocomposites
between TiO2 and CuInSe2: Towards solid state 3D solar cells |
Laboratory
of Inorganic Chemistry University of Delft, Delft, The Netherlands |
|
F. J. Gordillo-Vazquez |
Plasma
Chemistry in the CVD synthesis of nanodiamond films |
Instituto
de Optica, CSIC, Madrid, Sapain |
|
R. G. Gordon |
Atomic
layer deposition using precursors having metals coordinated
by nitrogen |
Department
of chemistry and chemical biology Harvard university Cambridge,
MA, USA |
|
R. F. Hicks |
Atmosheric
pressure plasma enhanced chemical vapour deposition of thin
films |
Department
of Chemical Engineering, University of California Los Angeles,
CA, USA |
|
Ph. Kalck |
Controlled
preparation of supported catalysts by low-temperature chemical
vapour deposition methods |
Laoratoire
de Catalyse et Polymers, ENSIACET, Toulouse, France |
|
G. Kasper |
Generation
and characterisation of composite Pd/SiO2 catalysts by CVD/CVD
in a continuous gas-phase/Aerosol Process |
Institute
für Mechanische Verfahrenstechnik und Mechanik
University of Karlsruhe, Karlsruhe, Germany |
|
Y. Kim |
Aminoalkoxide
groups as monovalent bidentate ligands for the precursors to
various metals and metal oxides and the application of the precursors
in MOCVD and ALD |
Thin
film materials laboratory, Korea research institute of chemical
technology, Daejeon, Korea |
|
F. Langlais |
Multiple
experimental investigation for understanding CVD mechanism:
Example of laminar polycarbon deposition |
Laboratoire
des Composites Thermostructuraux, Universite' Bordeaux 1, Pessac,
France |
| Y.-
H. Lee |
High
yield catalytic synthesis of thin multiwalled carbon nanotubes
and their field emission characteristics |
Department
of Physics, Center for Nanotubes and Nanostructured Composites,
Suwon, Republic of Korea |
|
M. Leskelä, |
Atomic
layer deposition of metal thin films |
Department
of chemistry, University of Helsinki, Finland |
|
M. Pons |
Numerical
simulation of SiC processes: A characterisation tool for the
design of epitaxial structures in electronics |
INPGrenoble-CNRS,
SaintMartin d'Heres Cedex, France |
|
R. van de Sanden |
The
growth of thin amorphous films from reactive gas phase species:
In-situ studies to unravel the growth mechanism |
Department
of Applied Physics Eindhoven University of Technology, Eindhoven,
The Netherlands |
| M.M.
Sung |
Selective
atomic layer deposition of titanium oxide on silicon and gold
with patterned self-assembled monolayers |
Department
of chemistry, Kookmin University, Seoul, Korea |
|
M. L. Terranova |
Growth
of nano-sized carbon structures with predefinite architectures |
Dip.
Scienze e tecnologie chimiche, Un. Tor Vergata, Via della Ricerca
Scientifica, Roma, Italy |
|
C. Winter |
Atomic
layer deposition of tungsten carbonitride thin films from a
new metalorganic precursor |
Department
of Chemistry Wayne State University Detroit, MI, USA, USA |
|
COMPANIES:
|
|
|
|
M. Caymax |
Si,
SIGe and Ge: High carrier mobility technology through selective
and non-selective epitaxial deposition |
IMEC,
Belgium |
|
P.-O. Hansson |
Low
temperature Epi for fabrication of Recessed Source/Drain |
Applied
Materials, USA |
|
J. Irven |
Precursor
chemistries for electronics, optics, and opto-electronics |
Air
products, UK |
|
J. W. Maes |
Atomic
layer deposition of dielectric and metal films for semiconductor
device applications |
ASM,
Leuven, Belgium |
| M.
Vogt |
PECVD
carbon as a new material for advanced DRAM production |
Infineon
Technologies, Dresden, Germany |
|
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