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| EUROCVD-15, September 4 - 9, 2005, Bochum - Germany |
| About EUROCVD-15: General Information - Advisory Board - Invited Speakers |
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Bochum is a city in
North Rhine-Westphalia (NRW), Germany. It is located in the Ruhr-Area
between the cities of Essen and Dortmund. Bochum provides many opportunities.
The city is actually much greener than one would think. Part of the city
centre is a designated leisure area. Bochum is a model for the structural
change of the whole Ruhr industrial region.
Although Bochum was founded in the 14th century, the town was insignificant
until the 19th century, when coal mining and steel industry emerged in
the Ruhr area, leading to the growth of the entire region. The population
of Bochum increased tenfold between 1850 and 1890. Between 1960 and 1973,
all the mines were closed. Other industries, such as car manufacturing,
compensated for the loss of jobs. Two castles from the "Middle Ages"have
survived on the northern banks of the Ruhr river. More famous are the
German Mining Museum, and the nostalgic Train Museum in the borough of
Dahlhausen. In 1965 the Ruhr University was founded (the first university
to be founded in post-war Federal Republic of Germany). Of course, vital
and vitalizing features of the town are the students of the Ruhr-University
(RUB), the largest in Ruhr-Area and a thriving pub culture of the "Bermuda
triangle" the night-life district in the city centre.
More information about Bochum city can be found at
http://www.bochum.de/english/
Scope and Topics
EUROCVD-15 will continue the biannual series of European CVD conferences started in Paris (1977) where its 25th anniversary has been celebrated in 2003 as CVD-XVI/EUROCVD-14 joint meeting with the Electrochemical Society (beginning in 1970). EUROCVD-13 was held in Athens (2001) and CVD-XV was held in Toronto (2000). These conferences offer a comprehensive review of the most recent research on chemical vapor deposition and related topics.
CVD is a versatile process for manufacturing thin films and nanomaterials of most different kinds. Products range from electronic and optical devices to smart coatings, chemical sensors, micromachines and heterogeneous catalysts. This conference will provide an opportunity to present and review new research on both fundamental and applied topics, to exchange ideas, and to promote international cooperation.
Papers describing the use of CVD to deposit novel materials (such as nanoscale- and biomaterials, polymers, transparent conducting oxides (TCO), electrochromics and micromachines) are particularly encouraged, as are papers discussing the application of new theoretical methods for modelling materials (such as density functional theory (DFT) and all-electron methods).
Invited Speakers
| ACADEMIA: | ||
|
D. Barreca |
Advances in synthetic strategies for metal oxide systems: A non-conventional hybrid CVD/Sol-gel Approach | Molecular Sciences and Technology Institute-CNR-Padova, Padova, Italy |
| S. George | Atomic layer deposition on polymers | Department of chemistry and biochemistry , University of Colorado Boulder, USA |
| A. Goosens | Nanocomposites between TiO2 and CuInSe2: Towards solid state 3D solar cells | Laboratory of Inorganic Chemistry University of Delft, Delft, The Netherlands |
| F. J. Gordillo-Vazquez | Plasma Chemistry in the CVD synthesis of nanodiamond films | Instituto de Optica, CSIC, Madrid, Sapain |
| R. G. Gordon | Atomic layer deposition using precursors having metals coordinated by nitrogen | Department of chemistry and chemical biology Harvard university Cambridge, MA, USA |
| R. F. Hicks | Atmosheric pressure plasma enhanced chemical vapour deposition of thin films | Department of Chemical Engineering, University of California Los Angeles, CA, USA |
| Ph. Kalck | Controlled preparation of supported catalysts by low-temperature chemical vapour deposition methods | Laoratoire de Catalyse et Polymers, ENSIACET, Toulouse, France |
| G. Kasper | Generation and characterisation of composite Pd/SiO2 catalysts by CVD/CVD in a continuous gas-phase/Aerosol Process | Institute
für Mechanische Verfahrenstechnik und Mechanik University of Karlsruhe, Karlsruhe, Germany |
| Y. Kim | Aminoalkoxide groups as monovalent bidentate ligands for the precursors to various metals and metal oxides and the application of the precursors in MOCVD and ALD | Thin film materials laboratory, Korea research institute of chemical technology, Daejeon, Korea |
| F. Langlais | Multiple experimental investigation for understanding CVD mechanism: Example of laminar polycarbon deposition | Laboratoire des Composites Thermostructuraux, Universite' Bordeaux 1, Pessac, France |
| Y.- H. Lee | High yield catalytic synthesis of thin multiwalled carbon nanotubes and their field emission characteristics | Department of Physics, Center for Nanotubes and Nanostructured Composites, Suwon, Republic of Korea |
| M. Leskelä, | Atomic layer deposition of metal thin films | Department of chemistry, University of Helsinki, Finland |
| M. Pons | Numerical simulation of SiC processes: A characterisation tool for the design of epitaxial structures in electronics | INPGrenoble-CNRS, SaintMartin d'Heres Cedex, France |
| R. van de Sanden | The growth of thin amorphous films from reactive gas phase species: In-situ studies to unravel the growth mechanism | Department of Applied Physics Eindhoven University of Technology, Eindhoven, The Netherlands |
| M.M. Sung | Selective atomic layer deposition of titanium oxide on silicon and gold with patterned self-assembled monolayers | Department of chemistry, Kookmin University, Seoul, Korea |
| M. L. Terranova | Growth of nano-sized carbon structures with predefinite architectures | Dip. Scienze e tecnologie chimiche, Un. Tor Vergata, Via della Ricerca Scientifica, Roma, Italy |
| C. Winter | Atomic layer deposition of tungsten carbonitride thin films from a new metalorganic precursor | Department of Chemistry Wayne State University Detroit, MI, USA, USA |
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COMPANIES: |
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| M. Caymax | Si, SIGe and Ge: High carrier mobility technology through selective and non-selective epitaxial deposition | IMEC, Belgium |
| P.-O. Hansson | Low temperature Epi for fabrication of Recessed Source/Drain | Applied Materials, USA |
| J. Irven | Precursor chemistries for electronics, optics, and opto-electronics | Air products, UK |
| J. W. Maes | Atomic layer deposition of dielectric and metal films for semiconductor device applications | ASM, Leuven, Belgium |
| M. Vogt | PECVD carbon as a new material for advanced DRAM production | Infineon Technologies, Dresden, Germany |
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EUROCVD International Advisory Board S.E. Alexandrow
(Russia) Local Organising
Committee |
National Advisory Board G. Brenner ( TU
Clausthal)
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Supported by
EUROCVD
German Research Foundation (DFG)
The Electrochemical Society (ECS)
Ruhr-University Bochum.
Fotos: Presseamt Stadt Bochum, Kulturstiftung Ruhr, RUB