Research Equipment

Synthetic Chemistry

The chair and the junior research groups associated with it (Jun-Prof. Dr. A. Devi und Dr. R. Schmid) are equipped with modern tools for metal-organic synthesis- and structural chemistry, for Chemical Vapor Deposition, material synthesis and characterization as well as a Linux-computer cluster for quantum chemical calculations.

Inert gas-workstations (about 20) for synthetic organometallic chemistry ("Schlenk technique"), four glove-boxes (MBraun) and a fully automatic solvent purification system provide the backbone for the preparative research.

Schlenk lines for chemical synthesis under inert gas

NC 2 (Lab rooms)

Highly pyrophoric compounds such as AlMe3 or ZnMe2 can be handled in a safe and easy way by using Schlenk technique. With modern equipment also the work with temperature- or light sensitive substances is feasible.

Glove-box for working under inert gas

NC2/29, NC2/28 and NC2/30
For the work with air- and water sensitive compounds four glove-boxes (MBraun) are accessible. These are equipped with oxygen and moisture sensors and partially also with microscopes and a refrigerator.Contact person: Markus Halbherr

Solvent drying system

The solvent purification system (MBraun) is purifying and drying solvents (currently pentane, hexane, THF, diethylether, and toluene) on a chromatographic basis over columns filled with aluminum oxide, molecular sieves or copper(I)oxide, depending on the solvent. The residual moisture is frequently checked by means of Karl-Fischer titration and is usually in a range below 5 ppm H2O.Contact person: Timo Bollermann

Karl-Fischer titration system

Karl-Fischer titration is a fast and easy way to determine residual moisture of solvents or samples. The method uses a redox reaction between H2O/I2 and SO2, which is electrochemically detected.Contact person: Uschi Hermann

X-ray crystallograhpy

For single crystal analyses, powder samples as well as high resolution measurements of thin films, three X-ray difractometers (Oxford Excalibur II, BRUKER-AXS Advance and BRUKER-AXS Discover) are available.(contact persons: Dr. C. Gemel, Dr. H. Parala, M. Winter)

Single-crystal difractometer (Oxford Excalibur II)

Single crystals of new compounds can be measured on a single crystal difractometer by Oxford Diffraction. The low temperature system (Oxford Instruments) allows routine measurements at 100K.Contact person: Manuela Winter, Dr. Christian Gemel

Powder difractometer (Bruker AXS Advance)

For an analysis of powder samples and thin films, an X-ray diffractometer (Bruker AXS) is available.Contact person: Dr. Harish Parala

High-resolution powder diffractometer (Bruker AXS Discover)

Precise analyses of high quality thin film samples are measured on a modern high resolution powder diffractometer (Bruker AXS).Contact person: Dr. Harish Parala

Chemical Vapor Deposition

For MOCVD experiments, two state of art industrial type research reactors are available. One of them, AIX-200-RF (AIXTRON) is designed for the deposition of metal nitrides, e.g., Group 13 nitrides and conducting metal nitrides as HfN, ZrN, TaN, WN. The other system AIX 200 FE equipped with a Trijet injecting system for a direct liquid-injection of precursor solutions into the reactor chamber for the deposition of metal oxides, mixed metal oxides, and noble metals.


NC 04/348-349
The industrial type research reactor AIX 200 RF (Aixtron) is used for manufacturing of high quality metal nitride thin films under industrial conditions. The attached glove-box allows handling of the air sensitive thin films under an inert gas atmosphere. Contact person: Dr. Harish Parala


NC 04/348-349
The research reactor AIX 200 FE (Aixtron) with a liquid injection system is employed for the fabrication of high quality metal oxide films under industrial conditions. The precursors developed in our group are tested here for their suitablitity in manufacturing of electronic devices. Contact person: Dr. Harish Parala

Home-built CVD reactor

NC 2/92
Three home-built CVD systems are available for a routine examination of a newly developed CVD precursor. Their simple and uncomplicated handling allows a quick screening of the suitability of such compounds for thin film preparation. Contact person: Dr. Harish Parala

ALD F120 (ASM)

NC 2/28
Atomic Layer Deposition (ALD) is used to fabricate ultra-thin and conformal thin film structures for many semiconductor and thin film device applications such as high dielectric constant (high-k) gate oxides, storage capacitor dielectrics and copper diffusion barriers in advanced electronic devices. A unique attribute of ALD is that it uses sequential self-limiting surface reactions to achieve control of film growth in the monolayer or sub-monolayer thickness regime. Contact person: Dr. Harish Parala, Maximillian Gebhard

Plasma ALD Reactor

NC 2/28
The Modular flow ALD Reactor is a self designed tool for academic research and development and very flexible for its use in ALD application. The system can be used for both thermal ALD (low temperature ALD process, up to 250°C) as well as Plasma ALD process which can coat 2” wafers, planar objects, and 3D objects as well as high aspect ratio structures. Contact person: Dr. Harish Parala, Maximillian Gebhard

TG/DTA 620 (Seiko Instruments)

NC 2/68
The Seiko Thermogravimetric/ Differential Thermal Analysis (TD/DTA) system is employed to determine the thermal behaviour and composition of newly developed precursors. The simultaneous TG/DTA system provides a simple and accurate way of determining the melting or decomposition points as well as processes such as vaporization, sublimation, and desorption. Contact person: Dr. Harish Parala


Photocell with gas detection

A photoelectrochemical cell is designed for in-situ detection of dioxygen during photoelectrochemical water splitting experiments. The home-made cell is equiped with an Oxysense sensor. Contact person: Jun.-Prof. Radim Beránek

Photocurrent Spectroscopy

The photocurrent spectroscopy system (Instytut Fotonowy, Poland, allows for determination of the efficiency of photocurrent generation (incident photon-to-current efficiency, IPCE) at various wavelengths in the UV and visible part of solar spectrum (300-800 nm). Contact person: Jun.-Prof. Radim Beránek


UV/Vis/NIR Spectometer (Perkin Elmer)

NC 2/58
We mainly use the UV-Vis spectroscopy for investigating nanoparticles. In the case of semiconductor nanoparticles the absorption peak gives information about the bandgap whereas the spectra of metallic nanoparticles display the surface plasmon resonance. UV-Vis can thus provide fast and easy information about particle size and shape as well as the composition and oxidation state of the metals involved.Contact person: Marie Katrin Schröter

Other equipment

Photo reactor

NC 2/66
This tailor-made falling film photo reactor is used in our group to deposit Cu at commercially available ZnO powders on the multigram scale and to produce large amounts of other metal composites (Ag, Au) as well as composite nanoparticles (Cu@TiO2 Cu@ZnO, Ag@TiO2, Au@TiO2) via photo-chemical processes. This photo reactor is capable of working with volumes up to 2 liters, being a semi-industrial batch producer.Contact person: Mahmoud Sliem