Publications 2011
"Malonate complexes of dysprosium: Synthesis, characterization and application for MOCVD of Dysprosium containing thin films"
A. P. Milanov, R. W. Seidel, D. Barreca, A. Gasparotto, M. Winter, J. Feydt, S. Irsen, H.-W. Becker, A. Devi,
Dalton Trans. 2011,40, 62
"Evaluation of homoleptic guanidinate and amidinate complexes of gadolinium and dysprosium for MOCVD of rare earth nitride thin films"
T. B. Thiede, M. Krasnopolski, A. P. Milanov, T. de los Arcos, A. Ney, H. W. Becker, D. Rogalla, J. Winter, A. Devi, R. A. Fischer,
Chem. Mater. 2011,(accepted)
"Basic investigation of HfO2 based metal-insulator-metal diodes"
P. Dudek, R. Schmidt, M. Lukosius, G. Lupina, C. Wenger, A. Abrutis, K. Xu, A. Devi,
Thin Solid Films 2010,(accepted)
"Influence of Na on the structure of Bi4Ti3O12 films deposited by liquid-delivery spin MOCVD"
J. Schwarzkopf1, R. Dirsyte, A. Devi, A. Kwasniewski, M. Schmidbauer, G. Wagner, M. Michling, D. Schmeisser, R. Fornari,
Thin Solid Films 2011,(accepted)
Seitenanfang
Publications 2010
"Growth of crystalline Gd2O3 thin films with high quality interface on Si(100) by low temperature H2O assisted atomic layer deposition"
A. P. Milanov, K. Xu, A. Laha, E. Bugiel, R. Ranjith, D. Schwendt, H. J. Osten, H. Parala, R. A. Fischer, A. Devi,
J. Am. Chem. Soc. 2010,132,132, 36
"ZnO Nanorod Arrays by Plasma-Enhanced CVD for Light-Activated Functional Applications"
D. Bekermann, A. Gasparotto, D. Barreca, A. Devi, R. A. Fischer, M. Kete, U. Lavrencic Stangar, O. I. Lebedev, C. Maccato, E. Tondello, G. Van Tendeloo,
ChemPhysChem 2010,11(11) ,2337
"All-Nitrogen Coordinated Amidinato Imido Complexes of Molybdenum and Tungsten: Syntheses and Characterization"
V. Gwildies, T. B. Thiede, S. Amirjalayer, L. Alsamman, A. Devi, R. A. Fischer,
Inorg. Chem. 2010,49(18),8487
"Deposition of SrRuO3 thin films on oxide substrates with liquid-delivery spin MOCVD"
J. Schwarzkopf, R. Dirsyte, A. Devi, M. Schmidbauer, G. Wagner, R. Fornari,
Thin Solid Films 2010,518,4675
"1D ZnO nano-assemblies by Plasma-CVD as chemical sensors for flammable and toxic gases"
D. Barreca , D. Bekermann , E. Cominic , A. Devi, R. A. Fischer, A. Gasparotto, C. Maccato, G. Sberveglieric, E. Tondello,
Sens. & Actuators (B): Chemical 2010,B149 (1) ,1
"Down scaling of defect passivated Gd2O3 thin films on p-Si(001) wafers grown by H2O assisted atomic layer deposition"
R. Ranjith, A. Laha, E. Bugiel, H. J. Osten, K. Xu, A. P. Milanov, A. Devi ,
Semicond. Sci. Technol. 2010,25,105001
"Growth and Characterization of Ti-Ta-O Thin Films on Si Substrates by Liquid Injection MOCVD for High-k Applications from Modified Titanium and Tantalum Precursors"
A. Devi, M. Hellwig, D. Barreca, H. Parala, R. Thomas, H.-W. Becker, Ram. S. Katiyar, R. A. Fischer, E. Tondello,
Chem. Vap. Deposition 2010,16, 157
"Highly Oriented ZnO Nanorod Arrays by a Novel Plasma Chemical Vapor Deposition Process"
D. Bekermann, A. Gasparotto, D. Barreca, L. Bovo, A. Devi, R. A. Fischer, O. I. Lebedev, C. Maccato, E. Tondello, G. Van Tendeloo,
Cryst. Growth & Design 2010,10,2012
"Volatile, Monomeric and Fluorine-free Precursors for the Metal Organic Chemical Vapor Deposition of Zinc Oxide"
D. Bekermann, D. Rogalla, H.-W. Becker, M. Winter, R. A. Fischer, A. Devi,
Eur. J. Inorg. Chem. 2010,9, 1366
"Urchin-like ZnO nanorod arrays for gas sensing applications"
D. Barreca, D. Bekermann, E. Comini, A. Devi, R. A. Fischer, A. Gasparotto, C. Maccato, C. Sada, G. Sberveglieri, E. Tondello,
CrystEngComm 2010,12, 3419
"Heteroleptic guanidinate and amidinate based complexes of hafnium as new precursors for MOCVD of HfO2"
K. Xu, A. P. Milanov, M. Winter, D. Barreca, A. Gasparotto, H.-W. Becker, A. Devi,
Eur. J. Inorg. Chem. 2010,11,1679
"Liquid injection MOCVD grown binary and ternary rare-earth oxides as alternative gate oxides for logic devices"
R. Thomas, P. Ehrhart, R. Waser, J. Schubert, A. Devi, R. S. Katiyar,
ECS Trans. 2010,33(3),211
"Engineered Tungsten Oxy-Nitride Thin Film Materials for Photocatalytical Water Splitting Fabricated by MOCVD"
S. Cwik, . A. P. Milanov, V. Gwildies, T. B. Thiede, V. S. Vidyarthi, A. Savan, R. Meyer, H.-W. Becker, D. Rogalla, A. Ludwig, R. A. Fischer, A. Devi,
ECS Trans. 2010,28(8), 159 Seitenanfang
Publications 2009
"Homoleptic Gadolinium Guanidinate: A Single Source Precursor for Metal-Organic Chemical Vapor Deposition of Gadolinium Nitride Thin Films"
A. P. Milanov, T. Thiede, A. Devi, R. A. Fischer,
J. Am. Chem. Soc. 2009,131,17062-17063
"Lanthanide Oxide Thin Films by Metalorganic Chemical Vapor Deposition Employing Volatile Guanidinate Precursors"
A. P. Milanov, T. Toader, H. Parala, D. Barreca, A. Gasparotto, C. Bock, H.-W. Becker, D. K. Ngwashi, R. Cross, S. Paul, U. Kunze, R. A. Fischer, A. Devi,
Chem. Mater. 2009,21,5443
"Zinc Malonate Based Precursors for MOCVD of ZnO"
D. Bekermann, D. Pilard, R. Fischer, and A. Devi,
ECS Transactions 2009,8,601-608
"An integrated experimental and theoretical investigation on Cu(hfa)2.TMEDA: structure, bonding and reactivity"
G. Bandoli, D. Barreca, A. Gasparotto, R. Seraglia, E. Tondello, A. Devi, R. A. Fischer, E. Fois, A. Gamba, G. Tabacchi,
Physical Chemistry Chemical Physics 2009,11, 5998
- Hot Article; May 2009
"Rare-earth based oxide and nitride thin films employing volatile homoleptic guanidinate precursors"
A. P. Milanov, T. Thiede, M. Hellwig, H. Parala, C. Bock, H.-W. Becker, D. K. Ngwashi, R. B. M. Cross, S. Paul, U. Kunze, R. A. Fischer, A. Devi,
ECS Transactions 2009,25,143
"Investigation of niobium nitride and oxy-nitride films grown by MOCVD "
D. Bekermann, D. Barreca, A. Gasparotto, H. W. Becker, R. A. Fischer, A. Devi,
Surf. Coatings and Technol. 2009,204,404
"MOCVD of gallium oxide thin films using homoleptic gallium complexes: Precursor evaluation and thin film characterization"
M. Hellwig, K. Xu, D. Barreca, A. Gasparotto, B. Niermann, J. Winter, H. W. Becker, D. Rogalla, R. A. Fischer, A. Devi,
ECS Transactions 2009,25,617
"Tuning the thermal properties of hafnium precursors by tailoring the ligands"
K. Xu, A. P. Milanov, A. Devi,
ECS Transactions 2009,25, 625
"Innovative M(hfa)2TMEDA (M=Cu, Co) Precursors for the CVD of Copper-Cobalt Oxides: An integrated theoretical and experimental approach"
A. Gasparotto, D. Barreca, A. Devi, R. A. Fischer, E. Fois, A. Gamba, C. Maccato, R. Seraglia, G. Tabacchi, E. Tondello,
ECS Transactions 2009,25,549
"Capacitance-Voltage Analysis of ZrO2 Thin films deposited by MOCVD techniques"
T. A. Mih, S.Paul, A. P. Milanov, R. Bhakta, A. Devi,
ECS Transactions 2009,25,901
"Hafnium carbamates and ureates: new class of precursors for low-temperature growth of HfO2 thin films"
R. Pothiraja, A. Milanov, D. Barreca, A. Gasparotto, H. W. Becker, M. Winter, R. A. Fischer, A. Devi*,
Chem. Commun. 2009,1978
"Novel gallium complexes with malonic diester anions as molecular precursors for the MOCVD of Ga2O3 thin films "
M. Hellwig, K. Xu, D. Barreca, A. Gasparotto, M. Winter, E. Tondello, R. A. Fischer, A. Devi,
Eur. J. Inorg. Chem. 2009,1110
"A cobalt(II) hexafluoroacetylacetonate ethylenediamine complex as CVD molecular source of cobalt oxides nanostructures"
G. Bandoli, D.Barreca, A.Gasparotto, C. Maccato, R. Seraglia, E. Tondello, A. Devi, R. A. Fischer, M. Winter,
Inorg. Chem. 2009,48,82
"Monomeric malonate precursors for the MOCVD of HfO2 and ZrO2 thin films"
R. Pothiraja, A. Milanov, H. Parala, M. Winter, R. A. Fischer and A. Devi,
Dalton Trans. 2009,4,654 Seitenanfang
Publications 2008
"Synthesis, characterization and thermal properties of homoleptic rare-earth guanidinates: Promising precursors for MOCVD and ALD of rare-earth oxide thin films"
A. Milanov, R. A. Fischer and A. Devi,
Inorg. Chem. 2008,47,11405
" MOCVD of niobium nitrides and oxy-nitrides using an all-nitrogen-coordinated precursor: thin-film deposition and mechanistic study"
D. Bekermann, D. Barreca, A. Devi, A. Gasparotto, and R. A. Fischer. ,
ECS Trans. 2008,16,235 Seitenanfang
Publications 2007
"Gd2O3 nanostructured thin films analyzed by XPS"
D. Barreca, A. Gasparotto, A. Milanov, E. Tondello, A. Devi, R. A. Fischer,
Surf. Sci. Spectra 2007,14,60
"Nanostructured Dy2O3 films: an XPS investigation"
D. Barreca, A. Gasparotto, A. Milanov, E. Tondello, A. Devi, R. A. Fischer ,
Surf. Sci. Spectra 2007,14,52
"Hafnium oxide thin film grown by ALD: an XPS study"
D. Barreca, A. Milanov, R. A. Fischer, A. Devi, E. Tondello,
Surf. Sci. Spectra 2007,14,34
"Stabilization of Amide-Based Complexes of Niobium and Tantalum Using Malonates as Chelating Ligands: Precursor Chemistry and Thin Film Deposition"
M. Hellwig, A. Milanov, D. Barecca, J.-L. Deborde, R. Thomas, M. Winter, U. Kunze, R. A. Fischer and A. Devi,
Chem. Mater. 2007,19,6077 - 6087
"Liquid injection MOCVD of TiO2 and SrTiO3 thin films from [Ti(OPri)2(tbaoac)2]: Film properties and compatibility with [Sr(thd)2]"
R. Thomas, R. Bhakta, P. Ehrhart, R. A. Fischer, R.Waser and A. Devi,
Surface Coatings and Technology 2007,201,9135–9140
"LI-MOCVD of HfO2 thin films using engineered amide based Hf precursors"
A. Milanov, R.Thomas, M. Hellwig, K. Merz, H.-W. Becker, P.Ehrhart, R. A. Fischer, R. Waser, and A. Devi,
Surface Coatings and Technology 2007,201,9109-9116
"Vaporizable metalorganic compounds for deposition of metals and metal-containing thin films."
Thenappan, Alagappan; Lao, Jingyu; Nair, Haridasan K.; Devi, Anjana; Bhakta,Raghunandan; Milanov, Andrian.,
Patent : PCT Int. Appl.2007,58pp. CODEN: PIXXD2 WO 2007005088 A2 20070111 CAN 146:133962 AN 2007:33784
"Thin films of ZrO2 for high-k applications employing engineered alkoxide and amide based MOCVD precursors"
R. Thomas, R. Bhakta, A. Milanov, A. Devi and P. Ehrhart,
Chem. Vap. Deposition2007,13,98
"Synthesis and characterisation of zirconium-amido guanidinato complex: A potential precursor for ZrO2 thin films"
A. Devi, R, Bhakta, A. Milanov, M. Hellwig, D. Barreca, E. Tondello, R. Thomas, P.Ehrhart, M. Winter, and R. A. Fischer,
Dalton Trans. 2007,17,1671 
see: Dalton Trans., 2007, 1641
"Thin films of HfO2 for high-k gate oxide applications from engineered alkoxide and amide based MOCVD precursors"
R.Thomas, E. Rije, P. Ehrhart, A. Milanov, R. Bhakta, A. Bauneman, A. Devi, R. A. Fischer and R. Waser,
J. Electrochem. Soc.
2007,154, G77
see: http://www.vjnano.org
"The synthesis of ZrO2/SiO2 nanocomposites by the two-step CVD of a volatile halogen-free Zr alkoxide in a fluidized-bed reactor"
W. Xia , Y. Wang, V. Hagen, A. Heel, G. Kasper, U. Patil, A. Devi, M. Muhler,
Chem. Vap. Deposition2007,13,37
"Investigation of Thermal Decomposition of the Titanium MOCVD Precursor [Ti(OPri)2(thd)2], Employing Matrix Isolation-FTIR technique"
R. Bhakta, H. Bettinger, and A. Devi,
ECS Transactions 2007,2,89 Seitenanfang
Publications 2006
"Metalorganic precursors for CVD and related techniques (ALD)"
A. Devi, R. Bhakta, A. Milanov,
German Patent: DE 10 2005 030 915.1 and US Patent : US 60/696,0722006,
"Guanidinate stabilized monomeric hafnium amide complexes as promising precursors for MOCVD of HfO2"
A. Milanov, R. Bhakta, A. Baunemann, H. W. Becker, R. Thomas, P. Ehrhart, M. Winter and A. Devi,
Inorganic Chemistry 2006,46,11008
"Precursor chemistry for TiO2: Titanium complexes with mixed nitrogen/oxygen ligand sphere"
A.Baunemann, M. Hellwig, A. Varade, R. Bhakta, M. Winter, S. A. Shivashankar, R. A. Fischer, and A. Devi,
Dalton Trans. 2006,28,3485
"Liquid injection MOCVD of ZrO2 thin films using zirconium bis (diethylamido)bis(di-tert-butylmalonato) as a novel precursor"
R. Thomas, A. Milanov, R. Bhakta, U. Patil, M. Winter, P. Ehrhart, R. Waser and A. Devi,
Chem. Vap. Deposition 2006,12,295
"MOCVD of ZrO2 and HfO2 thin films from modified monomeric precursors"
U. Patil, R. Thomas, A. Milanov, R. Bhakta, P. Ehrhart, R. Waser, R. Becker, H.-W. Becker, M. Winter, K. Merz, R. A. Fischer and A. Devi,
2006,12,172
"Mixed amide malonate compound of hafnium as a novel monomeric precursor for MOCVD of HfO2 thin films"
A. Milanov, R. Bhakta, R. Thomas, P. Ehrhart, M. Winter, R. Waser, A. Devi,
J. Mater. Chem. 2006,16,437 Seitenanfang
Publications 2005
"High-k dielectric materials by metalorganic chemical vapor deposition: Growth and characterization"
R. Thomas, S. Regnery, P. Ehrhart , R. Waser, R. Bhakta, U. Patil, A. Devi,
Ferroelectrics 2005,327,111
"Materials chemistry of group-13 nitrides"
A. Devi, R. Schmid, J. Müller, R. A. Fischer ,
Topics in Organometallic Chemistry 2005,9,49
"Synthesis and structure of Bis(2-butyl-N,N’-diisopropylamidinateo)dichloro-hafnium(IV)"
A. Milanov, R. Bhakta, M. Winter, K. Merz, A. Devi,
Acta Cryst. C 2005,61,m 370
"Metal-Organic CVD of conductive and crystalline hafnium nitride films"
Y. Kim, A. Baunemann, H. Parala, A. Devi, R. A. Fischer,
Chem. Vap. Deposition 2005,11,294
"Zirconium dioxide thin films for high-k applications by MOCVD from novel mononuclear precursors"
R. Thomas, U. Patil, P. Ehrhart, A. Devi, R. Waser,
Proc. Electrochem. Soc. 2005,944
"Volatile single source precursors for the MOCVD of metal silicate thin films"
U. Patil, H.-W. Becker, M. Winter, R. A. Fischer, A. Devi,
Proc. Electrochem. Soc. 2005, 913
"Selective growth of tantalum nitride and hafnium nitride thin films on OTS patterned Si(100) substrates by MOCVD method"
B. C. Kang, A. Baunemann, Y. Kim, J. H. Lee, D. Y. Jung, A. Devi, H. Parala, R. A. Fischer, J. H. Boo,
Proc. Electrochem. Soc. 2005,326
"MOCVD of TiO2 thin films on OTS modified Si(100) substrates by micro-contact printing: Selective growth and new characterisation technique with micro-Raman spectroscopy"
B. C. Kang, J. H. Lee, D. Y. Jung, J. H. Boo, A. Devi, R. Bhakta, R. A. Fischer, S. H. Hong,
Proc. Electrochem. Soc. 2005,320
"Gas phase decomposition studies on the MOCVD precursor [Ti(OC3H7)4] using matrix-isolation FTIR spectroscopy"
R. Bhakta, E. Gemel, J. Müller, A. Devi,
Proc. Electrochem. Soc. 2005,312 Seitenanfang
Publications 2004
"Precursor engineering and evaluation: Studies on the nature of molecular mechanisms involved in the MOCVD of TiO2 thin films"
R. Bhakta, R. Thomas, F. Hipler, H. Bettinger, J. Müller, P. Ehrhart, A. Devi,
J. Mater. Chem. 2004,14, 3231
"Mononuclear precursor for MOCVD of HfO2 thin films"
A. Baunemann, R. Becker, M. Winter, R. A. Fischer, R. Thomas, P. Ehrhart, R. Waser, A. Devi,
Chem. Commun. 2004,14,1610
- Hot paper; July 2004 Seitenanfang
Publications 2003
"MOCVD of copper films from copper ethylacetoacetate: Experiment and thermodynamic analysis"
S. Mukhopadhyay, K. Shalini, A. Devi, S. A. Shivashankar,
Proc. Electrochem. Soc. 2003, 1275
"Nanostructures of group-III nitrides by MOCVD using molecular precursors"
J. Khanderi, A. Wohlfart, H. Parala, A. Devi, R. A. Fischer,
Proc. Electrochem. Soc.
"MOCVD of TiO2 thin films using a new class of metalorganic precursors"
R. Bhakta, U. Patil, A. Devi,
Proc. Electrochem. Soc. 2003,2,1477
"Zinc amide compounds as potential precursors for the synthesis of zinc nitride"
E. Maile, A. Devi, R. A. Fischer,
Proc. Electrochem. Soc. 2003,2, 975
"A study on the metalorganic chemical vapor deposition of pure copper films from low cost copper(II) ) dialkylamino-2-propoxides: Tuning the thermal properties of the precursor by small variations of the ligand"
R. Becker, A. Devi, J. Weiß, U. Weckenmann, M. Winter, C. Kiener, H. W. Becker, R. A. Fischer,
Chem. Vap. Deposition 2003,9,149
"MOCVD of gallium nitride nanostructures using (N3)2Ga{(CH2)3NR2} R=Me, Et as single molecule precursor: Morphology control and materials characterization"
J. Khanderi, A. Wohlfart, H. Parala, A. Devi, J. Hambrock, A. Birkner, R. A. Fischer,
J. Mater. Chem. 2003,13,1438
"Mononuclear mixed-ketoester-alkoxide compound of Ti as a promising precursor for MOCVD of TiO2 thin films"
R. Bhakta, S. Regnery, F. Hipler, M. Winter, P. Ehrhart, R. Waser, A. Devi,
Chem. Vap. Deposition 2003,9,295
"Organische Puffer machen Metalloxide flüssig: Chemische Verpackungskünste für neue Computerchips"
A. Devi,
ChemieRubin 2003,56
"Synthesis and structure of mixed isopropoxide-beta-ketoester and beta-ketoamide zirconium complexes: Potential precursors for MOCVD of ZrO2"
U. Patil, M. Winter, H. W. Becker, A. Devi,
J. Mater. Chem.2003,13, 2177 Seitenanfang
Publications 2002
"Thermodynamic investigation of the MOCVD of Cu films from bis(2,2,6,6-tetramethyl-3,5-heptadionato)copper (II)"
S. Mukhopadhyay, K. Shalini, A. Devi, S. A. Shivashankar,
Bull. Mater. Sci. 2002,25,391
"Synthesis of nano-scale TiO2 particles by non-hydrolytic approach"
H. Parala, A. Devi, R. Bhakta, R. A. Fischer,
J. Mater. Chem. 2002,12,1625
"Morphology controlled growth of arrays of GaN nanopillars and randomly distributed GaN nanowires on sapphire using (N3)2Ga[(CH2)3NMe2)] as a single molecule precursor"
A. Wohlfart, A. Devi, E. Maile, R. A. Fischer,
Chem. Comm. 2002, 998
"MOCVD of aluminium oxide films using aluminium beta-diketonates as precursors"
A. Devi, S. A. Shivashankar, A.G. Samuelson,
J. Phys. IV 2002,12, 139
"Strongly oriented thin films of Co3O4 deposited on single crystal MgO(100) by low-pressure, low-temperature MOCVD"
A. U. Mane, K. Shalini, A. Devi, S. A. Shivashankar,
J. Cryst. Growth 2002,240,157
"Metalorganic chemical vapor deposition of Cu films from bis(t-butyl-3-oxo-butanato(copper (II): Thermodynamic investigation and experimental verification"
S. Mukhopadhyay, K. Shalini, R. Lakshmi, A. Devi, S. A. Shivashankar,
Surface and Coatings Technology 2002,150, 205 Seitenanfang
Publications 2001
"Investigations on InN Whiskers grown by Chemical Vapor Deposition"
H. Parala, A. Devi, F. Hipler, E. Maile, A. Birkner, Hans W. Becker, R. A. Fischer,
J. Cryst. Growth 2001,231,68
"Nanosized GaN Particles by Chemical Vapor Infiltration"
H. Parala, A. Devi, A. Birkner, R. A Fischer,
Proc. Electrochem. Soc. 2001,13,429
"Indium Nitride Whisker Growth by Chemical Vapor Deposition"
H. Parala, A. Devi, F. Hipler, A. Birkner, R. A. Fischer,
Proc. Electrochem. Soc. 2001,13, 356
"Growth of porous columnar alpha-GaN layers on c-plane Al2O3 by MOCVD using Bisazido dimethylaminopropyl gallium as single source precursor"
A. Wohlfart, A. Devi, F. Hipler, H. W. Becker, R. A. Fischer,
J. Phys. IV 2001,11, 683
"An Efficient Chemical Solution Deposition Method for Epitaxial GaN layers using Single Molecule Precursor"
H. Parala, A. Devi, A. Wohlfart, M. Winter, R. A. Fischer,
Adv. Functional Mater. 2001,11, 224
"Indium Nitride Whisker Growth by Chemical Vapor Deposition"
H. Parala, A. Devi, F. Hipler, A. Birkner, R. A. Fischer,
Proc. Electrochem. 2001,13, 356
"Chemical Vapor Deposition of Copper using Copper(II) Amino Alkoxides"
R. Becker, J. Weiß, A. Devi, R. A. Fischer,
J. Phys. IV 2001,11,569
"Synthesis of GaN Particles in Porous Matrices by Chemical Vapor Infiltration of Single Molecule Precursors"
H. Parala, A. Devi, W. Rogge, A. Birkner, R. A. Fischer,
J. Phys. IV2001,11,473
"Growth of InN Whiskers From Single Source Precursors"
A. Devi, H. Parala, A. Wohlfart, A. Birkner, R. A. Fischer,
J. Phys. IV 2001,11,577
"A study of nucleation and growth in MOCVD: The growth of thin films of Alumina"
M. P. Singh, S. Mukhopadhyay, A. Devi, S. A. Shivashankar,
Mater. Res. Soc. Symp. Proc. 2001,648,P6.47 Seitenanfang
Publications 2000
"Growth Kinetics and Mechanistic Studies of GaN Thin Films Grown by OMVPE using (N3)2Ga[(CH2)3NMe2] as Single Source Precursor"
A. Wohlfart, A. Devi, W. Rogge, R. A. Fischer, M. D. Allendorf, C. F. Melius,
Proc. Electrochem. Soc. 2000,13, 697
"CVD of Thin Films of Copper and Cobalt from Different Precursors: Growth Kinetics and Microstructure"
A. Mane, K. Shalini, A. Devi, R. Lakshmi, M. S. Dharmaprakash, M. Paranjape, S. A. Shivashankar,
Mat. Res. Soc. Symp. Proc.
"Precursor Chemistry of Group-III Nitrides XVI: Synthesis and Structure of Monomeric Penta Coordinated Intramolecularly Adduct Stabilized Amidobisazides of Aluminium, Gallium and Indium with and all Nitrogen Coordination Sphere: OMCVD of GaN using (N3)2Ga{N[CH2CH2(NEt2)]2}"
H. Sussek, O. Stark, A. Devi, H. Pritzkow, R. A. Fischer,
J. Organomet. Chem. 2000,602, 29
"A Study on Bisazido(dimethylaminopropyl)gallium as Precursor for OMVPE of Gallium Nitride in a Cold Wall Reactor System at Reduced Pressure"
A. Devi, W. Rogge, A. Wohlfart, F. Hipler, H. W. Becker, R. A. Fischer,
Chem. Vap. Deposition 2000,6, 245
"Growth Kinetics of GaN Thin Films Grown by MOVPE Using Single Molecule Precursors"
R. A. Fischer, A. Wohlfart, A. Devi, W. Rogge,
Mater. Res. Soc. Internet J. Nitride Semicond. Res. 2000,5, U136-U141 Suppl. 1.
"Epitaxy, Disperse Powders and Colloids of Gallium Nitride achieved by transformation of single source precursors"
H. Winkler, A. Devi, A. Manz, A. Wohlfart, W. Rogge, R. A. Fischer,
Physica Status Solidi A 2000,177,27
"Precursor Chemistry for OMVPE of Group-13 Nitrides"
R. A. Fischer, A. Devi,
Developments in Crystal Growth Research 2000,2, 61 Seitenanfang
Publications 1999
"Molecular Precursors to Group-13 Nitrides, 14: Synthesis and Structures of (N3)2Ga[(CH2)3NMe2], (N3)Ga[(CH2)3NMe2]2 and (N3)3Ga(NR3) (R= CH3, C2H5)"
A. Devi, H. Sussek, H. Pritzkow, M. Winter, R. A. Fischer,
Eur. J. Inorg. Chem. 1999,12,2127
"OMVPE of GaN using (N3)2Ga[(CH2)3NMe2] (BAZIGA) in a Cold Wall Reactor"
A. Devi, W. Rogge, R. A. Fischer, F. Stowasser, H. W. Becker, J. Schaefer, J. Wolfrum,
J. Phys. IV 1999,(P8) Part 2 ,589
"Thermal Analysis of Metalorganic Complexes of Copper for Evaluation as CVD Precursors"
A. Devi, S. A. Shivashankar,
J. Therm. Anal. Calorim. 1999,55,259 Seitenanfang
Publications 1998
"Chemical Vapor Deposition of Copper Films from Copper Ethylacetoacetate: Microstructure and Electrical Resistivity"
A. Devi, S. A. Shivashankar,
J. Mater. Sci. Lett.1998,17,367
"A New Cu (II) precursor for CVD: Synthesis, Characterization and Application"
A. Devi, J. Goswami, L. Raghunathan, S. A. Shivashankar, S. Chandrasekaran,
J. Mater. Res. Seitenanfang
Publications 1996
"A Low Temperature Structure of Two Copper Based Precursors for MOCVD: Bis(tert-butyl acetoacetato)aquo Copper(II) and Bis(dipivaloylmethanato) Copper(II)"
S. Pattnaik, T. N. Guru Row, L. Raghunathan, A. Devi, J. Goswami, S. A. Shivashankar, S. Chandrasekaran, W. T. Robinson,
Acta Cryst. C 1996,52,89
"Chemical Vapor Deposition of Thin Films of Copper Using a New Metalorganic Precursor"
J. Goswami, L. Raghunathan, A. Devi, S. A. Shivashankar, S. Chandrasekaran,
J. Mater. Sci. Lett. 1996,15,573 Seitenanfang
Publications 1995
"Thermal Investigations on Single Bimetallic Precursors for MOCVD of Ferroelectric Oxide Thin Films"
M. M. A. Sekar, A.G.Samuelson, A. Devi, S. A. Shivashankar,
Proceedings of the 10th National Symposium on Thermal Analysis 1995,139
"Evaluation by Thermal Analysis of Metalorganic Precursors for Chemical Vapor Deposition of Thin Films of Copper"
A. Devi, R. Lakshmi, J. Goswami, S. A. Shivashankar and S. Chandrasekaran,
Proceedings of the 10th National Symposium on Thermal Analysis1995,117 Seitenanfang
Publications 1994
"Growth and Microstructure of Copper Films deposited from different Cu(II) Precursors"
J. Goswami, S. A. Shivashankar, L. Raghunathan, A. Devi, K. V. Ramanathan,
Mater. Res. Soc. Symp. Proc.1994,337, 691